Alloy sputtering at high fluence: preferential sputtering and competing effects
نویسندگان
چکیده
منابع مشابه
CoCrPtTa/Ti Perpendicular Media Deposited at High Sputtering Rate
CoCrPtTa/Ti bilayer thin films have been sputter deposited onto both glass and Al substrates under high sputtering rate in a manufacturing environment. From microstructure and magnetic property studies, it is found that Cr segregation and stacking fault density are the two major issues in obtaining high quality perpendicular media. (0002) texture orientation spread and lattice parameter remain ...
متن کاملSurfactant sputtering
Sputter erosion of materials is among the most important techniques for fabricating advanced thin film coatings. Sputter processes are also of considerable relevance for surface polishing down to an atomic scale, nanostructuring of surfaces as dot and ripple patterns and micromachining of materials using focused ion beams or reactive ion etching. We present a new, versatile sputter technique ut...
متن کاملCrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study
CrNx (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission streng...
متن کاملHigh power impulse magnetron sputtering discharge
J. T. Gudmundsson, N. Brenning, Daniel Lundin and Ulf Helmersson, High power impulse magnetron sputtering discharge, 2012, Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, (30), 030801. http://dx.doi.org/10.1116/1.3691832 Copyright: American Vacuum Society, This article may be downloaded for personal use only. Any other use requires prior permission of the author and the ...
متن کاملHigh Energy Sputtering from Cleaned Metal Foils *
Positive and negative secondary ions desorbed from metal foils by bombardment with 252Cf fission products have been investigated by time-of-flight mass spectroscopy. The measurements were performed under UHV conditions using metal foils of Cu, Ni and Al cleaned by Ar-ion etching. Spectra were taken with cleaned surfaces and also under the exposure of H2 , 0 2 , N2 , CO, C2H4 , C2H6 and C3H70H u...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
سال: 1993
ISSN: 0168-583X
DOI: 10.1016/0168-583x(93)96029-c